Improvement on the radiometric temperature measurement in small laser-processing region

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 33 >Issue 1 >Page 6 > Article

Opto-Electronic Engineering
Vol. 33, Issue 1, 6 (2006)

Improvement on the radiometric temperature measurement in small laser-processing region

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Improvement on the radiometric temperature measurement in small laser-processing region[J]. Opto-Electronic Engineering, 2006, 33(1): 6 Copy Citation Text

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References

[3] STRITZKER B,POSPIESZCZYK A,TAGLE J.A.Measurement of lattice temperature of silicon during pulsed laser annealing[J].Physical Review Letters,1981,47(5):356-358.

[4] GUIDOTTI Daniel,WILMAN John G.Novel and nonintrusive optical thermometer[J].Appl.Phys.Lett,1992,60(5):524-526.

[5] ZHOU Y.H,ZHANG Z.M,D.P.DeWITT,et al.Effects of radiative properties of surfaces on radiometric temperature measurement[A].9th int.Conference on Advanced Thermal Processing of Semiconductors-RTP'[C].Hilton Anchorage,Alaska:IEEE,2001.179-188.

[11] RYU Zee M.Measurement of point spread function of thermal imager[J].SPIE,1991,1467:469-474.

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