• Acta Physica Sinica
  • Vol. 69, Issue 17, 174207-1 (2020)
Qian Wang1、2、3, Jiang-Shan Zhao1、2、3, Yuan-Yuan Fan1、2、3、4, Xin Guo1、2, and Yi Zhou1、2、3、*
Author Affiliations
  • 1Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100094, China
  • 2Beijing Excimer Laser Technology and Engineering Center, Beijing 100094, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
  • 4State Key Laboratory of Applied Optics, Changchun 130033, China
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    DOI: 10.7498/aps.69.20200087 Cite this Article
    Qian Wang, Jiang-Shan Zhao, Yuan-Yuan Fan, Xin Guo, Yi Zhou. Analysis of ArF excimer laser system discharge characteristics in different buffer gases[J]. Acta Physica Sinica, 2020, 69(17): 174207-1 Copy Citation Text show less
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    Qian Wang, Jiang-Shan Zhao, Yuan-Yuan Fan, Xin Guo, Yi Zhou. Analysis of ArF excimer laser system discharge characteristics in different buffer gases[J]. Acta Physica Sinica, 2020, 69(17): 174207-1
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