Author Affiliations
1Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100094, China2Beijing Excimer Laser Technology and Engineering Center, Beijing 100094, China3University of Chinese Academy of Sciences, Beijing 100049, China4State Key Laboratory of Applied Optics, Changchun 130033, Chinashow less
Fig. 1. Simulation process of discharge dynamics of excimer.
Fig. 2. Discharge circuit.
Fig. 3. Waveforms of discharge voltage, current, and photon number density (He is the buffer gas).
Fig. 4. Waveforms of discharge voltage, current, and photon number density (Ne is the buffer gas).
Fig. 5. Electron number density spatial distribution: (a) He as the buffer gas; (b) Ne as the buffer gas.
Fig. 6. Waveforms of Ne+, Ne*, He+, He* number density.
Fig. 7. Waveforms of electron number density at 0.2 cm from cathode: (a) Considering photoionization; (b) without photoionization.
Fig. 8. Waveforms of discharge voltage, current, and photon number density with and without Xe.
Fig. 9. Waveforms of electron number density spatial distribution with Xe.
Fig. 10. Waveforms of photon number density with different Xe ratios.
| 反应类型 | 反应过程 | 反应系数 | 参考文献 | | 电子碰撞反应 | Ar + e → Ar+ + 2e
| 计算玻尔兹曼方程得到 | | | Ar + e → Arex + e
| 计算玻尔兹曼方程得到 | | | Ar + e → Ar* + e
| 计算玻尔兹曼方程得到 | | | Ar* + e → Ar+ + 2e
| 计算玻尔兹曼方程得到 | | | F2 + e → F– + F
| 计算玻尔兹曼方程得到 | | | He + e → He+ + 2e
| 计算玻尔兹曼方程得到 | | | He + e → Heex + e
| 计算玻尔兹曼方程得到 | | | He + e → He* + e
| 计算玻尔兹曼方程得到 | | | 中性粒子反应 | Ar+ + 2 Ar → Ar2+ + Ar
| 2.5 × 10–31 cm6·s–1 | [15]
| | Ar+ + F– → ArF* | 1 × 10–6 cm3·s–1 | [15]
| | Ar2+ + F–→ ArF* + Ar | 1 × 10–6 cm3·s–1 | [15]
| | Arex → Ar + hγ’
| 1.0 ns | [15]
| | Ar* + F2 → ArF* + F | 8 × 10–10 cm3·s–1 | [15]
| | ArF*→Ar + F + hγ | 42 ns | [15]
| | 受激辐射 | ArF* + hγ → ArF + 2hγ | 4 × 10–16 cm3·s–1 | [15]
| | 光电离 | hγ + F– → F + e
| 1 × 10–17 cm3 | [15]
| | Arex + hγ → Ar+ + e
| 1 × 10–18 cm3 | [15]
|
|
Table 1. Plasma reaction process of ArF excimer laser system (He is the buffer gas).
| 反应类型 | 反应过程 | 反应系数 | 参考文献 | | 电子碰撞反应 | Ar + e → Ar+ + 2e
| 计算玻尔兹曼方程得到 | | | Ar + e → Arex + e
| 计算玻尔兹曼方程得到 | | | Ar + e → Ar* + e
| 计算玻尔兹曼方程得到 | | | Ar* + e → Ar+ + 2e
| 计算玻尔兹曼方程得到 | | | F2 + e → F – + F
| 计算玻尔兹曼方程得到 | | | Ne* + e → Ne+ + 2e
| 计算玻尔兹曼方程得到 | | | Ne + e → Ne+ + 2e
| 计算玻尔兹曼方程得到 | | | Ne + e → Ne* + e
| 计算玻尔兹曼方程得到 | | | 中性粒子反应 | Ne2* + e → 2e + Ne2+ | (9.75 × 10–9) × (abs(Te))0.71 × exp(–3.4/abs(Te))
| [16]
| | Ne2+ + e → Ne* + Ne
| (3.7 × 10–8) × (abs(Te))–0.43 | [16]
| | Ar+ + 2Ar → Ar2+ + Ar
| 2.5 × 10–31 cm6·s–1 | [15]
| | Ar+ + F– → ArF* | 1 × 10–6 cm3·s–1 | [15]
| | Ar2+ + F– → ArF* + Ar | 1 × 10–6 cm3·s–1 | [15]
| | Arex → Ar + hγ’
| 1.0 ns | [15]
| | Ar* + F2 → ArF* + F | 8 × 10–10 cm3·s–1 | [15]
| | 2Ne* → Ne+ + Ne + e
| 5 × 10–10 cm3·s–1 | [17]
| | Ne+ + 2Ne →Ne2+ + Ne
| 4.4 × 10–32 cm6·s–1 | [17]
| | Ne* + Ne + Ne → Ne2* + Ne
| 4 × 10–34 cm6·s–1 | [17]
| | Ar + ArF* → 2Ar + F
| 9 e × 10-12 cm3·s–1 | [15]
| | Ne + ArF* → Ar + Ne + F
| 1 × 10–12 cm3·s–1 | [17]
| | F2 + ArF* → Ar + 3F
| 1.9 × 10–9 cm3·s–1 | [15]
| | 受激辐射 | ArF* + hγ → ArF + 2hγ | 4 × 10–16 cm3·s–1 | [15]
| | 光电离 | hγ + F– → F + e
| 1 × 10–17 cm3 | [15]
| | Arex + hγ → Ar++ e
| 1 × 10–18 cm3 | [15]
| | Xe + hγ’→Xe++ e
| 阈值为 12.1 eV, 截面为1 × 10–16 cm2 | [18]
|
|
Table 2. Plasma reaction process of ArF excimer laser system (Ne is buffer gas).
