• Journal of Infrared and Millimeter Waves
  • Vol. 32, Issue 6, 498 (2013)
ZHANG Li-Yao1、2、*, QIAO Hui1, and LI Xiang-Yang1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    DOI: 10.3724/sp.j.1010.2013.00498 Cite this Article
    ZHANG Li-Yao, QIAO Hui, LI Xiang-Yang. The difference between etching bromine and polishing on HgCdTe material and photoconductive detector[J]. Journal of Infrared and Millimeter Waves, 2013, 32(6): 498 Copy Citation Text show less
    References

    [1] Chang W H, Lee T, Lau W M. An x-ray photoelectron spectroscopic study of chemical etching and chemo-mechanical polishing of HgCdTe[J].Appl.Phys,1990,68(9): 48164819.

    [2] Antoszewski J, Seymour D J, Faraone L, et al. Magneto-transport characterization using quantitative mobility-spectrum analysis[J].Electron.Mater,1995,24(9):12551262.

    [3] Srivastav V, Pal R , Sharma B L, et al. Etching of mesa structures of HgCdTe[J]. Electron. Mater,2005,34(11):14401445.

    ZHANG Li-Yao, QIAO Hui, LI Xiang-Yang. The difference between etching bromine and polishing on HgCdTe material and photoconductive detector[J]. Journal of Infrared and Millimeter Waves, 2013, 32(6): 498
    Download Citation