• Journal of Infrared and Millimeter Waves
  • Vol. 32, Issue 4, 304 (2013)
YU Jie1、*, WANG Chong1, YANG Zhou1, CHEN Xiao-Shuang2, and YANG Yu1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3724/sp.j.1010.2013.00304 Cite this Article
    YU Jie, WANG Chong, YANG Zhou, CHEN Xiao-Shuang, YANG Yu. Simulation analysis of electrical characteristics of strained SiGe channel-on-insulator p-MOSFET[J]. Journal of Infrared and Millimeter Waves, 2013, 32(4): 304 Copy Citation Text show less
    References

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    [2] Tsutomu T, Naoharu S, Tomohisa M, et al. Ultrathin body SiGe-on-insulator pMOSFETs with high-mobility SiGe surface channels [J]. IEEE Trans. on Electron Devices, 2003, 50(4): 1328-1333.

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    [4] Tsutomu T, Shu N, Yoshihiko M, et al. High-mobility strained SiGe-on-insulator pMOSFETs with Ge-rich surface channels fabricated by local condensation technique [J]. IEEE Electron Device Lett., 2005, 26(4): 243-245.

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    [17] Tsutomu T, Toshifumi I, Toshinori N, et al. Relationship between hole mobility and current drive enhancement in uniaxially strained thin-body SiGe-on-Insulator pMOSFETs [C]. Symposium on VLSI technology Digest of Technical Papers, 2006: 146-147.

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    YU Jie, WANG Chong, YANG Zhou, CHEN Xiao-Shuang, YANG Yu. Simulation analysis of electrical characteristics of strained SiGe channel-on-insulator p-MOSFET[J]. Journal of Infrared and Millimeter Waves, 2013, 32(4): 304
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