In this research, the effects of target sputtering power on the structure and optical properties of radio frequency (RF) sputtered Ti6Al4V films were investigated. Different sputtering RF powers were used to produce different thicknesses of Ti6Al4V thin films. From the X-ray diffraction, it was found that the Ti6A14V films had polycrystalline cubic and hexagonal structures and increased films crystallinity and crystalline size with increasing the sputtering power. Atomic forces microscopy (AFM) gave us a nanometric film character, films homogeneity, and surfaces roughness. A higher degree of roughness and average grain size with increasing RF power was exhibited. Band gap and refractive index of Ti6Al4V thin films varied with sputtering RF powers.