• Laser & Optoelectronics Progress
  • Vol. 60, Issue 13, 1316017 (2023)
Jinlei Zhou, Xihu Lei, Benshan Zou, Yingqiang Shen, and Feng Gao*
Author Affiliations
  • Guangxi Key Laboratory of Nonferrous Metals and Characteristic Materials Processing, School of Resources, Environment and Materials, Guangxi University, Nanning 530004, Guangxi, China
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    DOI: 10.3788/LOP223157 Cite this Article Set citation alerts
    Jinlei Zhou, Xihu Lei, Benshan Zou, Yingqiang Shen, Feng Gao. Structure and Properties of Nano-Silicon Doped Bi3.79Er0.03Yb0.18Ti2.97W0.03O12∶xSi Upconversion Phosphor[J]. Laser & Optoelectronics Progress, 2023, 60(13): 1316017 Copy Citation Text show less

    Abstract

    A series of Si-doped Bi3.79Er0.03Yb0.18Ti2.97W0.03O12xSi phosphors were prepared by high temperature solid-state sintering, and their structures and upconversion fluorescence properties were explored. The experimental and test results show that the Bi3.79Er0.03Yb0.18Ti2.97W0.03O12xSi phosphors prepared in different atmospheres are Bi4Ti3O12 phase with single layered perovskite like structure. Si is mainly Si4+ in the phosphor, indicating that even in the argon atmosphere, most of the doped Si is oxidized. Si doping increases the density and surface smoothness of the material, reduces the optical band gap and enhances the light absorption. Under 980 nm infrared light excitation, the upconversion emission spectra of all samples show three emission bands centered at 525 nm, 545 nm, and 765 nm, respectively, corresponding to the electronic transitions in the Er3+4f electron layer. The luminescence intensity and fluorescence lifetime of the sample doped with 6% Si mole fraction are about twice as that of the sample without doping Si, indicating that Si doping can significantly improve the photoluminescence performance of rare earth doped bismuth titanate based phosphors
    Jinlei Zhou, Xihu Lei, Benshan Zou, Yingqiang Shen, Feng Gao. Structure and Properties of Nano-Silicon Doped Bi3.79Er0.03Yb0.18Ti2.97W0.03O12∶xSi Upconversion Phosphor[J]. Laser & Optoelectronics Progress, 2023, 60(13): 1316017
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