• Optics and Precision Engineering
  • Vol. 32, Issue 19, 2889 (2024)
Yuqi REN1,3, Yunfan YUE1,3, Sheng LI1,4, Nianyao CHAI1,4..., Xiangyu CHEN1,3, Zhongle ZENG1,4, Fengyi ZHAO2, Huan WANG1,3 and Xuewen WANG1,2,4|Show fewer author(s)
Author Affiliations
  • 1Center of Femtosecond Laser Manufacturing for Advanced Materials and Devices, State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan430070, China
  • 2Foshan Xianhu Laboratory, Foshan58000, China
  • 3School of Materials Science and Engineering, Wuhan University of Technology, Wuhan40070, China
  • 4International School of Materials Science and Engineering, Wuhan University of Technology, Wuhan30070, China
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    DOI: 10.37188/OPE.20243219.2889 Cite this Article
    Yuqi REN, Yunfan YUE, Sheng LI, Nianyao CHAI, Xiangyu CHEN, Zhongle ZENG, Fengyi ZHAO, Huan WANG, Xuewen WANG. Femtosecond laser annealing of 4H-SiC interfaces and optimization of their electrical performance[J]. Optics and Precision Engineering, 2024, 32(19): 2889 Copy Citation Text show less
    Raman spectra of sample with femtosecond laser annealing
    Fig. 1. Raman spectra of sample with femtosecond laser annealing
    SEM images of sample surface under different fluences
    Fig. 2. SEM images of sample surface under different fluences
    Schematic diagram of I-V curve testing
    Fig. 3. Schematic diagram of I-V curve testing
    I-V characteristics of sample with different laser fluences and scanning spacings
    Fig. 4. I-V characteristics of sample with different laser fluences and scanning spacings
    I-V characteristics of sample with different laser fluences and number of effective pulses
    Fig. 5. I-V characteristics of sample with different laser fluences and number of effective pulses
    EDS map analysis of 4H-SiC before and after laser annealing
    Fig. 6. EDS map analysis of 4H-SiC before and after laser annealing
    XPS spectra of 4H-SiC samples before and after annealing treatment
    Fig. 7. XPS spectra of 4H-SiC samples before and after annealing treatment
    参 数样品标准
    样品尺寸/mm10×10
    厚度/μm500±25
    晶片方向On axis:<0001>±5°
    表面粗糙度双抛CMP Ra≤0.5 nm
    电阻率0.02~0.1 Ω·cm
    Table 1. Parameters of 4H-SiC
    仪器/设备名称型号(生产厂家)
    飞秒激光器Pharos(Light Conversion)
    场发射扫描电镜附加X-Max N80能谱仪JSM-7500F
    共聚焦拉曼光谱仪Alpha300R(WITec)
    X射线光电子能谱仪AXIS SUPRA
    霍尔效应测试仪HMS-7000
    Table 2. Experimental setup for femtosecond laser annealing
    参 数退火前退火后
    温度/K300300
    电导率/(S·m-11.71×10-40.56×101
    迁移率/(cm·(V-1·S-1))1.971.99
    载流子浓度(1/cm-35.40×10131.77×1018
    霍尔系数/(cm-3·C-1-1.15×105-3.52
    Table 3. Hall testing of 4H-SiC before and after annealing
    Yuqi REN, Yunfan YUE, Sheng LI, Nianyao CHAI, Xiangyu CHEN, Zhongle ZENG, Fengyi ZHAO, Huan WANG, Xuewen WANG. Femtosecond laser annealing of 4H-SiC interfaces and optimization of their electrical performance[J]. Optics and Precision Engineering, 2024, 32(19): 2889
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