[1] Kogelschatz U. IEEE Trans. Plasma Sci, 2002, 30(4): 1400.

[2] Mangolini L, Orlov K, et al. Appl. Phys. Lett., 2002, 80(10): 1722.

[3] Ammel T E, Astrov Y U A, Purwins H G. Phys. Rev. E, 1998, 58: 7109.

[5] Jiang Nan, Qian Sheng Fa, Wang Long, et al. Thin Solid Film, 2001, 390: 119.

[7] Li Xuechen, Dong Lifang, Wang Long. Chin. Phys., 2005, 14(7): 1418.

[8] Hong Y, Uhm H. Microplasma. Appl. Phys. Lett., 2006, 89: 221504.

[9] Li Xuechen, Dong Lifang, Zhao Na, et al. Appl. Phys. Lett., 2007, 91: 161507.

[10] Dong Lifang, Qi Yuyan, Liu Weiyuan, et al. J. Appl. Phys., 2009, 106: 013301.

[11] Lu Xinpei, Jiang Zhonghe, Xiong Qing, et al. Appl. Phys. Lett., 2008, 92: 081502.

[12] Dong Lifang, Zhang Yanzhao, Liu Weiyuan, et al. Appl. Phys. Lett., 2009, 94: 091502.

[13] Miclea M, Kunze K, Heitmann U, et al. J. Phys. D: Appl. Phys., 2005, 38: 1709.

[14] Staack David, Farouk Bakhtier, et al. Plasma Sources Sci. Technol., 2006,15: 818.