• Optics and Precision Engineering
  • Vol. 15, Issue 4, 447 (2007)
1,2, 1,2, 1,2, 2, and 1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on dimensional precision of UV-lithography on SU-8 photoresist[J]. Optics and Precision Engineering, 2007, 15(4): 447 Copy Citation Text show less
    References

    [1] ZHANG J,TAN K L,GONG H Q.Characterization of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems material characterization[J].Polymer Testing,2001,20(6):693-701.

    [7] CHAN-PARK M B,ZHANG J,YAN Y H,et al..Fabrication of large SU-8 mold with high aspect ratio microchannels by UV exposure dose reduction[J].Sensor Actuator B:Chemical,2004,101(1-2):175-182.

    [9] LAWES R A.Manufacturing tolerances for UV-LIGA using SU-8 resist[J].J.Micromech.Microeng.,2005,15 (11):2198-2203.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on dimensional precision of UV-lithography on SU-8 photoresist[J]. Optics and Precision Engineering, 2007, 15(4): 447
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