Study on dimensional precision of UV-lithography on SU-8 photoresist

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Optics and Precision Engineering >Volume 15 >Issue 4 >Page 447 > Article

Optics and Precision Engineering
Vol. 15, Issue 4, 447 (2007)

Study on dimensional precision of UV-lithography on SU-8 photoresist

^1,2, ^1,2, ^1,2, ², and ¹

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¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on dimensional precision of UV-lithography on SU-8 photoresist[J]. Optics and Precision Engineering, 2007, 15(4): 447 Copy Citation Text

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References

[1] ZHANG J,TAN K L,GONG H Q.Characterization of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems material characterization[J].Polymer Testing,2001,20(6):693-701.

[7] CHAN-PARK M B,ZHANG J,YAN Y H,et al..Fabrication of large SU-8 mold with high aspect ratio microchannels by UV exposure dose reduction[J].Sensor Actuator B:Chemical,2004,101(1-2):175-182.

[9] LAWES R A.Manufacturing tolerances for UV-LIGA using SU-8 resist[J].J.Micromech.Microeng.,2005,15 (11):2198-2203.

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on dimensional precision of UV-lithography on SU-8 photoresist[J]. Optics and Precision Engineering, 2007, 15(4): 447

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