• Chinese Journal of Quantum Electronics
  • Vol. 22, Issue 6, 840 (2005)
[in Chinese]*, [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Nano-photolithography using super-resolution near-field structure[J]. Chinese Journal of Quantum Electronics, 2005, 22(6): 840 Copy Citation Text show less
    References

    [1] Betzig E, Trantman J. Near-field optics: microscopy, spectroscopy, and surface modification beyond the diffraction limit [J]. Science, 1992, 257(10): 189-195.

    [2] Riehn R, et al. Near-field optical lithography of a conjugated polymer [J]. Appl. Phys. Lett., 2003, 82(4): 526-528.

    [3] Tominaga J, Nakano T, Atoda N. An approach for recording and readout beyond the diffraction limit with a Sb thin film [J]. Appl. Phys. Lett., 1998, 73(15): 2078-2080.

    [4] Fuji H, et al. A near-field recording and readout technology using a meallic probe in an optical disk [J]. Jpn. J.Appl. Phys., 2000, 39(1): 980-981.

    [5] Kuwahara M, et al. High-speed near-field photography by super-resolution near-field structure [J]. Jpn. J. Appl.Phys., 1999, 38: L1079- L1081.

    [6] Kuwahara M, et al. Less than 0.1mm linewidth fabrication by visible light using super-resolution near-field structure [J]. Microelectronic Eng., 2001, 57-58: 883-890.

    [7] Luo Xiangang, Teruya I. Surface plasmon resonant interference nanolithography technique [J]. Appl. Phys. Lett.,2004, 84: 4780-4782.

    [8] Melville D O S, et al. Submicron imaging with a planar silver lens [J]. Appl. Phys. Lett., 2004, 84: 4403-4405.

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Nano-photolithography using super-resolution near-field structure[J]. Chinese Journal of Quantum Electronics, 2005, 22(6): 840
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