Fig. 1. Schematic diagram for the preparation process of large-area hydrogel micropatterns

Fig. 2. Schematic diagram of the chemical structures of the component of photoresist. (a) Monomer; (b) Crosslinker; (c) Photoinitiators

Fig. 3. SEM images of large-size microstructures. (a)~(d) The designed pattern of large-size microstructures; (e)~(h) SEM images of large-size micropatterns; (i)~(l) Enlarged local details of large-size micropatterns

Fig. 4. Small-size microstructures prepared under different exposure conditions. (a) Laser power is 50 μW~60 μW, exposure time is 700 ms; (b) Laser power is 120 μW~140 μW, exposure time is 1500 ms

Fig. 5. (a)~(h) The bright field images of contact angle and (i) contact angle analysis of microstructures with different sizes

Fig. 6. Fluorescence and SEM images of cells cultured on large-size microstructures after 48 h. (a) Confocal fluorescence images, blue: nuclei stained by DAPI, excitation wavelength is 405 nm, collected wavelength range is 410 nm~460 nm, red: actin stained ActinRed 555, excitation wavelength is 561 nm, collected wavelength range is 570 nm~620 nm; (b) SEM images and (c) magnified SEM images of local details

Fig. 7. Fluorescence and SEM images of cells cultured on small-size microstructures after 48 h. (a)~(d) 3D confocal fluorescence images, blue: nuclei stained by DAPI, excitation wavelength is 405 nm, collected wavelength range is 410 nm~460 nm, red: actin stained ActinRed 555, excitation wavelength is 561 nm, collected wavelength range is 570 nm~620 nm; (e)~(h) SEM images