[3] LORENZE H,DESPONT M,FAHRNI N,et al..High-aspect-ratio,ultra thick,negative-tone near-UV-LIGAphotoresist and its applications for MEMS[J].Sensors and Actuators A,1998,64:33-39.

[4] CHANG H K,KIM Y K.UV-LIGA process for high aspect ratio structure using stress barrier and C-shape etchhole[J].Sensors and Actuators A,2000,84:342-350.

[8] KLEIN C A.How accurate are Stoney's equation and recent modifications[J].Journal of Applied Physics,2000,88(9):5487-5489.