LOW-TEMPERATURE GROWTH OF ULTRA-THIN NANO-CRYSTALLINE DIAMOND FILMS BY HFCVD IN A CH4/H2 MIXTURE

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

[1] Ong T P,Chang R P H.Low-temperature deposition of diamond films for optical coatings [ J ].Appl.Phys.Lett.,1989,55:2063-2065.

[2] Zhou,D,McCauley T G,Qin L C,et al.Synthesis of nanocrystalline diamond thin films from an Ar-CH4 microwave plasma [J].J.Appl.Phys.,1998,83:540-543.

[3] Zhang F,Zhang Y F,Gao Q J,et al.The roles of argon addition in the hot filament chemical vapor deposition system [ J].Diamond and Related Materials,2001,10:1523-1527.

[4] Shi C R,Pang G F,Shi Y.Synthesis of high-quality diamond thin film on large area [ J ].Proceedings of SPIE,1995,2364:578-581.

[5] Hao T L,Shi C R.Study on enhancement of diamond nucleation on fused silica substrate by ultrasonic pretreatment[ J].Diamond and Related Materials,2004,13:465-472.

[6] Wada N,Solin S A.Raman efficiency measurement of graphite [ J].Physica B,1981,105:353-356.

[7] Nemanich R J,Glass J T,Lucovsky G,et al.Raman scattering characterization of carbon bonding in diamond and diamondlike thin films [ J ].J.Vac.Sci.,Technol.A,1988,6:1783-1787.