• High Power Laser Science and Engineering
  • Vol. 6, Issue 4, 04000e55 (2018)
Jianqiang Zhu1、2, Jian Zhu2、3, Xuechun Li1、2, Baoqiang Zhu1、2, Weixin Ma2、3, Xingqiang Lu1、2, Wei Fan1、2, Zhigang Liu1、2, Shenlei Zhou1、2, Guang Xu1、2, Guowen Zhang1、2, Xinglong Xie1、2, Lin Yang1、2, Jiangfeng Wang1、2, Xiaoping Ouyang1、2, Li Wang1、2, Dawei Li1、2, Pengqian Yang1、2, Quantang Fan1、2, Mingying Sun1、2, Chong Liu1、2, Dean Liu1、2, Yanli Zhang1、2, Hua Tao1、2, Meizhi Sun1、2, Ping Zhu1、2, Bingyan Wang1、2, Zhaoyang Jiao1、2, Lei Ren1、2, Daizhong Liu1、2, Xiang Jiao1、2, Hongbiao Huang1、2, and Zunqi Lin1、2
Author Affiliations
  • 1National Laboratory on High Power Laser and Physics, Shanghai 201800, China
  • 2Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 3Shanghai Institute of Laser Plasma, Chinese Academy of Engineering and Physics, Shanghai 201800, China
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    DOI: 10.1017/hpl.2018.46 Cite this Article Set citation alerts
    Jianqiang Zhu, Jian Zhu, Xuechun Li, Baoqiang Zhu, Weixin Ma, Xingqiang Lu, Wei Fan, Zhigang Liu, Shenlei Zhou, Guang Xu, Guowen Zhang, Xinglong Xie, Lin Yang, Jiangfeng Wang, Xiaoping Ouyang, Li Wang, Dawei Li, Pengqian Yang, Quantang Fan, Mingying Sun, Chong Liu, Dean Liu, Yanli Zhang, Hua Tao, Meizhi Sun, Ping Zhu, Bingyan Wang, Zhaoyang Jiao, Lei Ren, Daizhong Liu, Xiang Jiao, Hongbiao Huang, Zunqi Lin. Status and development of high-power laser facilities at the NLHPLP[J]. High Power Laser Science and Engineering, 2018, 6(4): 04000e55 Copy Citation Text show less
    Photographs of a series of laser facilities built at the NLHPLP.
    Fig. 1. Photographs of a series of laser facilities built at the NLHPLP.
    Schematic view of the layout of the multifunctional platform.
    Fig. 2. Schematic view of the layout of the multifunctional platform.
    Operational shots of SG-II facility for physical experiments.
    Fig. 3. Operational shots of SG-II facility for physical experiments.
    Operational shots of SG-II UP facility for physical experiments.
    Fig. 4. Operational shots of SG-II UP facility for physical experiments.
    Photographs of the SG-II UP facility: (a) laser hall and (b) target chamber.
    Fig. 5. Photographs of the SG-II UP facility: (a) laser hall and (b) target chamber.
    Schematic of the optical layout of one beamline.
    Fig. 6. Schematic of the optical layout of one beamline.
    Near-field fluence distributions of the $1\unicode[STIX]{x1D714}$ output (shot No. 20150721002): (a) near-field images and (b) fluence probability distribution.
    Fig. 7. Near-field fluence distributions of the $1\unicode[STIX]{x1D714}$ output (shot No. 20150721002): (a) near-field images and (b) fluence probability distribution.
    Far-field fluence distributions of the $1\unicode[STIX]{x1D714}$ output (shot No. 20150721002): (a) enclosed focal spot energy fraction and (b) far-field image.
    Fig. 8. Far-field fluence distributions of the $1\unicode[STIX]{x1D714}$ output (shot No. 20150721002): (a) enclosed focal spot energy fraction and (b) far-field image.
    Experimental output capability for $1\unicode[STIX]{x1D714}$ with different pulse widths of the laser prototype.
    Fig. 9. Experimental output capability for $1\unicode[STIX]{x1D714}$ with different pulse widths of the laser prototype.
    Experimental output capability of $3\unicode[STIX]{x1D714}$ with different pulse widths.
    Fig. 10. Experimental output capability of $3\unicode[STIX]{x1D714}$ with different pulse widths.
    Near and far fields of the $3\unicode[STIX]{x1D714}$ output measured by PDS: (a) near-field image, (b) far-field image, and (c) enclosed $3\unicode[STIX]{x1D714}$ focal spot energy fraction.
    Fig. 11. Near and far fields of the $3\unicode[STIX]{x1D714}$ output measured by PDS: (a) near-field image, (b) far-field image, and (c) enclosed $3\unicode[STIX]{x1D714}$ focal spot energy fraction.
    $3\unicode[STIX]{x1D714}$ output energy per beam for four consecutive shots.
    Fig. 12. $3\unicode[STIX]{x1D714}$ output energy per beam for four consecutive shots.
    $3\unicode[STIX]{x1D714}$ output power imbalance for eight beams (shot 4).
    Fig. 13. $3\unicode[STIX]{x1D714}$ output power imbalance for eight beams (shot 4).
    Pulse shape in the (a) front end and (b) end of the main amplifier.
    Fig. 14. Pulse shape in the (a) front end and (b) end of the main amplifier.
    Interface of Laser Designer and the comparison of the experimental and simulation results.
    Fig. 15. Interface of Laser Designer and the comparison of the experimental and simulation results.
    (a) Regenerative amplifier, (b) output near-field profile, (c) energy stability of the regenerative amplifier for 8 h, and (d) square-pulse distortion of the regenerative amplifier.
    Fig. 16. (a) Regenerative amplifier, (b) output near-field profile, (c) energy stability of the regenerative amplifier for 8 h, and (d) square-pulse distortion of the regenerative amplifier.
    (a) Physical photograph of the optically addressed liquid crystal spatial light modulator and (b) demonstration of near-field spatial intensity control.
    Fig. 17. (a) Physical photograph of the optically addressed liquid crystal spatial light modulator and (b) demonstration of near-field spatial intensity control.
    Main amplifier of the SG-II UP ns laser facility.
    Fig. 18. Main amplifier of the SG-II UP ns laser facility.
    (a) CSF alignment package and (b) resultant image.
    Fig. 19. (a) CSF alignment package and (b) resultant image.
    TSF alignment package (top) and result images (bottom): (a) crystals, (b) TSF pass-1 pinhole, and (c) TSF pass-2 pinhole.
    Fig. 20. TSF alignment package (top) and result images (bottom): (a) crystals, (b) TSF pass-1 pinhole, and (c) TSF pass-2 pinhole.
    Basic scheme for single-shot beam diagnostics in high-power laser systems with the CMI method.
    Fig. 21. Basic scheme for single-shot beam diagnostics in high-power laser systems with the CMI method.
    Comparison of the near-field intensity and phase: (a) near-field intensity reconstructed by the CMI method, (b) near-field intensity measured by direct imaging, (c) near-field phase reconstructed by the CMI method, and (d) near-field phase measured by a Shack–Hartmann wavefront sensor.
    Fig. 22. Comparison of the near-field intensity and phase: (a) near-field intensity reconstructed by the CMI method, (b) near-field intensity measured by direct imaging, (c) near-field phase reconstructed by the CMI method, and (d) near-field phase measured by a Shack–Hartmann wavefront sensor.
    Comparison of the far-field intensity: (a) far-field intensity reconstructed by the CMI method, (b) far-field intensity measured by direct imaging, (c) encircled energy of the far-field focal spots in panel (a), and (d) encircled energy of the far-field focal spot in panel (b).
    Fig. 23. Comparison of the far-field intensity: (a) far-field intensity reconstructed by the CMI method, (b) far-field intensity measured by direct imaging, (c) encircled energy of the far-field focal spots in panel (a), and (d) encircled energy of the far-field focal spot in panel (b).
    Stray light management by ground glass protection in the FOA.
    Fig. 24. Stray light management by ground glass protection in the FOA.
    Results of the surface quality of KDP crystal: (a) wavefront distribution after low-pass filter (spatial period ${>}$ 3.3 cm), (b) wavefront distribution after band passed filter (spatial period 2.5 mm–33 mm), (c) surface roughness data measured by surface profiler.
    Fig. 25. Results of the surface quality of KDP crystal: (a) wavefront distribution after low-pass filter (spatial period ${>}$ 3.3 cm), (b) wavefront distribution after band passed filter (spatial period 2.5 mm–33 mm), (c) surface roughness data measured by surface profiler.
    Schematic diagram of the SG-II UP picosecond laser system.
    Fig. 26. Schematic diagram of the SG-II UP picosecond laser system.
    Photograph of large-aperture gratings.
    Fig. 27. Photograph of large-aperture gratings.
    Far field of picosecond laser system.
    Fig. 28. Far field of picosecond laser system.
    Pulse contrast measurement result of picosecond laser system[50].
    Fig. 29. Pulse contrast measurement result of picosecond laser system[50].
    (a) Photograph of the OPCPA and (b) output energy and stability data of the OPCPA.
    Fig. 30. (a) Photograph of the OPCPA and (b) output energy and stability data of the OPCPA.
    Comparison of the spectral results before and after shaping: (a) front-end output and (b) main amplifier output.
    Fig. 31. Comparison of the spectral results before and after shaping: (a) front-end output and (b) main amplifier output.
    (a) Exterior of the compression chamber and (b) layout of the pulse compressor (plan view); G1, G2, G3, and G4 are the tiled MLD gratings and M1 and M2 are the mirrors; the light passes through G1, G2, G3, and G4 sequentially (arrow direction).
    Fig. 32. (a) Exterior of the compression chamber and (b) layout of the pulse compressor (plan view); G1, G2, G3, and G4 are the tiled MLD gratings and M1 and M2 are the mirrors; the light passes through G1, G2, G3, and G4 sequentially (arrow direction).
    Picosecond laser damage of gratings. (a) Typical morphology of pinpoint damages on the grating and (b) linear damage area growth with shot number.
    Fig. 33. Picosecond laser damage of gratings. (a) Typical morphology of pinpoint damages on the grating and (b) linear damage area growth with shot number.
    Deformable mirror of the AO setup for the petawatt picosecond laser chain.
    Fig. 34. Deformable mirror of the AO setup for the petawatt picosecond laser chain.
    Laser auxiliary alignment system. CCRS-NW: northwest chamber center reference system; CCRS-NE: northeast chamber center reference system; TAS: target alignment sensor; TPS: target positioning system; OAPM: off-axis parabola mirror[83].
    Fig. 35. Laser auxiliary alignment system. CCRS-NW: northwest chamber center reference system; CCRS-NE: northeast chamber center reference system; TAS: target alignment sensor; TPS: target positioning system; OAPM: off-axis parabola mirror[83].
    Schematic diagram of the pulse contrast measurement. $\text{M}_{\text{X}1}$, $\text{M}_{\text{X}2}$, $\text{M}_{\text{X}3}$, and $\text{M}_{\text{X}4}$ are mirrors; $\text{P}_{1}$, $\text{P}_{2}$, and $\text{P}_{3}$ are removable parallel plates; $\text{L}_{1}$, $\text{L}_{2}$, and $\text{L}_{3}$ are cylindrical lenses; $\text{A}_{1}$, $\text{A}_{2}$, and $\text{A}_{3}$ are attenuators; SHGC is the autocorrelation generation crystal; XCGC is the cross-correlation generation crystal; and PMT is the photomultiplier tube.
    Fig. 36. Schematic diagram of the pulse contrast measurement. $\text{M}_{\text{X}1}$, $\text{M}_{\text{X}2}$, $\text{M}_{\text{X}3}$, and $\text{M}_{\text{X}4}$ are mirrors; $\text{P}_{1}$, $\text{P}_{2}$, and $\text{P}_{3}$ are removable parallel plates; $\text{L}_{1}$, $\text{L}_{2}$, and $\text{L}_{3}$ are cylindrical lenses; $\text{A}_{1}$, $\text{A}_{2}$, and $\text{A}_{3}$ are attenuators; SHGC is the autocorrelation generation crystal; XCGC is the cross-correlation generation crystal; and PMT is the photomultiplier tube.
    Schematic diagram of the SG-II 5 PW laser facility; OAPM: off-axis parabolic mirror, FM: frequency modulator, and AWG: arbitrary waveform generator.
    Fig. 37. Schematic diagram of the SG-II 5 PW laser facility; OAPM: off-axis parabolic mirror, FM: frequency modulator, and AWG: arbitrary waveform generator.
    Compressed pulse duration with the whole beam diameter.
    Fig. 38. Compressed pulse duration with the whole beam diameter.
    (a) Measured focal spot imaged by the CCD after AO correction without optical parametric amplification, (b) horizontal and vertical line-outs of focal spot image, and (c) focal spot imaged by an X-ray pinhole camera in the high-energy experiments.
    Fig. 39. (a) Measured focal spot imaged by the CCD after AO correction without optical parametric amplification, (b) horizontal and vertical line-outs of focal spot image, and (c) focal spot imaged by an X-ray pinhole camera in the high-energy experiments.
    Spectrum of the first OPCPA stage.
    Fig. 40. Spectrum of the first OPCPA stage.
    Energy and stability of signal pulses from the first OPCPA stage.
    Fig. 41. Energy and stability of signal pulses from the first OPCPA stage.
    Facility Output capability Feature
    SG-II facility8 nanosecond beams:$0.75~\text{kJ}/1$$\text{ns}/1\unicode[STIX]{x1D714}/\unicode[STIX]{x1D6F7}20~\text{cm}/$per beam$0.3~\text{kJ}/1~\text{ns}/3\unicode[STIX]{x1D714}/\unicode[STIX]{x1D6F7}20~\text{cm}/$per beamDouble-pass, co-axial $2\times 2$ array main amplifier; good energy stability; high laser pointing accuracy[10] and excellent operation
    SG-II 9th laser system$5.13~\text{kJ}/3.4~\text{ns}/1\unicode[STIX]{x1D714}/\unicode[STIX]{x1D6F7}32~\text{cm}$$3~\text{kJ}/3.4~\text{ns}/3\unicode[STIX]{x1D714}/\unicode[STIX]{x1D6F7}32~\text{cm}$ 30 ps–80 ps 120 ps–5 nsMOPA configuration; higher energy; valuable probe beam
    SG-II UP facility8 nanosecond beams: 5 kJ ($\max$ 8.5 kJ)$/$5 ns$/$1$\unicode[STIX]{x1D714}/$31 cm $\times$ 31 cm$/$per beam (routine on target) 3 kJ$/$3.3 ns$/3\unicode[STIX]{x1D714}/$31 cm $\times$ 31 cm$/$per beam (routine on target) laser prototype: 16 kJ$/$5 ns$/1\unicode[STIX]{x1D714}/$31 cm $\times$ 31 cm 17.5 kJ$/$20  ns$/1\unicode[STIX]{x1D714}/31$  cm $\times$ 31 cmLarge-aperture four-pass $2\times 2$ main amplifier; good beam quality; flexible pulse shaping; higher fluence
    PW picosecond beam: 1 kJ$/$1–10 ps$/1\unicode[STIX]{x1D714}/\unicode[STIX]{x1D6F7}32$ cm 10$^{20}$ W$/$cm$^{2}$, SNR ${>}10^{-8}$ (before $-$81.75 ps)Large energy; high focal power density; high signal to noise ratio; OPCPA $+$ CPA amplification; fast ignition research
    SG-II 5 PW system5 PW$/$808 nm$/$29 cm $\times$ 29 cm (designed), 1.76 PW$/$808 nm$/$21 fs$/$29 cm $\times$ 29 cm (phase two)Ultra-short higher power; OPCPA amplification new function and technology
    Table 1. Output capability and feature of the present facilities.
    Jianqiang Zhu, Jian Zhu, Xuechun Li, Baoqiang Zhu, Weixin Ma, Xingqiang Lu, Wei Fan, Zhigang Liu, Shenlei Zhou, Guang Xu, Guowen Zhang, Xinglong Xie, Lin Yang, Jiangfeng Wang, Xiaoping Ouyang, Li Wang, Dawei Li, Pengqian Yang, Quantang Fan, Mingying Sun, Chong Liu, Dean Liu, Yanli Zhang, Hua Tao, Meizhi Sun, Ping Zhu, Bingyan Wang, Zhaoyang Jiao, Lei Ren, Daizhong Liu, Xiang Jiao, Hongbiao Huang, Zunqi Lin. Status and development of high-power laser facilities at the NLHPLP[J]. High Power Laser Science and Engineering, 2018, 6(4): 04000e55
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