• Laser & Optoelectronics Progress
  • Vol. 49, Issue 8, 83201 (2012)
Xu Bin1、*, Wu Xiaoyu1, Ling Shiquan1, Luo Feng1, Du Chenlin2, and Sun Xiuquan2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop49.083201 Cite this Article Set citation alerts
    Xu Bin, Wu Xiaoyu, Ling Shiquan, Luo Feng, Du Chenlin, Sun Xiuquan. Numerical Simulation of Thermal Electron Emission in Metal Films Ablated by Multi-Pulse Femtosecond Laser[J]. Laser & Optoelectronics Progress, 2012, 49(8): 83201 Copy Citation Text show less

    Abstract

    The characteristics of thermal electron emission of the metal films ablated by multi-pulse femtosecond laser are investigated using the two-temperature model (TTM) coupled with the Richardson-Dushman equation. In the numerical simulation, the variations of reflectivity and absorption of metal films with the change of the number of femtosecond laser pulses and pulse spacing are considered and the dynamic numerical simulation is achieved. It is found that, with the change of femtosecond laser pulse number and pulse spacing, the reflectivity and absorption coefficient of metal films would be raised and the absorptivity would be decreased. And the change of the parameters would have a significant influence on the thermal electron emission and the temperature field of metal films. Meanwhile, with the depth raising, the influence would be diminished.
    Xu Bin, Wu Xiaoyu, Ling Shiquan, Luo Feng, Du Chenlin, Sun Xiuquan. Numerical Simulation of Thermal Electron Emission in Metal Films Ablated by Multi-Pulse Femtosecond Laser[J]. Laser & Optoelectronics Progress, 2012, 49(8): 83201
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