Design of Reduced Projection Lens for Digital Lithography

LIU Haiyong; ZHOU Jinyun; LEI Liang; LIU Lixia; LIU Zhitao; GUO Hua

doi:10.3969/j.issn.1003-501x.2013.07.010

Journals >Opto-Electronic Engineering >Volume 40 >Issue 7 >Page 57 > Article

Opto-Electronic Engineering
Vol. 40, Issue 7, 57 (2013)

Design of Reduced Projection Lens for Digital Lithography

LIU Haiyong^*, ZHOU Jinyun, LEI Liang, LIU Lixia, LIU Zhitao, and GUO Hua

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[in Chinese]

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DOI: 10.3969/j.issn.1003-501x.2013.07.010 Cite this Article

LIU Haiyong, ZHOU Jinyun, LEI Liang, LIU Lixia, LIU Zhitao, GUO Hua. Design of Reduced Projection Lens for Digital Lithography[J]. Opto-Electronic Engineering, 2013, 40(7): 57 Copy Citation Text

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References

[1] Seo M, Kim H, Park M. Maskless Lithographic Pattern Generation System upon Micromirrors [J]. Computer-Aided Design & Applications(S1686-4360), 2006, 3(1/4): 185-192.

[2] Guo X, Du J, Guo Y, et al. Simulation of DOE fabrication using DMD-based gray-tone lithography [J]. Microelectronic Engineering(S0167-9317), 2006, 83(4): 1012-1016.

[4] Kim K R, Park I T, Kim H W, et al. Laser Imaging System for Flat Panel Display Industry [C]// Laser Microfabrication Conference, 2005: 420-423.

[5] Hansotte E J, Carignan E C, Meisburger W D. High speed maskless lithography of printed circuit boards using digital micromirrors [J]. Proceedings of SPIE(S0277-786X), 2011, 7932: 793207.

LIU Haiyong, ZHOU Jinyun, LEI Liang, LIU Lixia, LIU Zhitao, GUO Hua. Design of Reduced Projection Lens for Digital Lithography[J]. Opto-Electronic Engineering, 2013, 40(7): 57

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