A lithography method based on the single-mode-resonance (SMR) interference in the resist by employing the cylinder grating (CG) coupled structure is proposed. The CG coupled structure is used as a mask, and then the dielectric waveguide can be formed by combining CG with resist layer and substrate. Interference pattern will be generated in the resist using the specific diffraction order (±1) from the CG diffraction. The resist layer plays the role of waveguide which can enhance the light field intensity 25～50 times stronger and greatly improve the light energy utilization ratio. Through simulation, the nanostructure with period smaller than λ/3 and groove width ranging of 42~88 nm (λ/10～λ/5) can be obtained with incident light wavelength of 441 nm.