A micro-and nanofiber pen (MNFP) direct writing technique for fabricating submicron lines is presented. Contact exposure is adopted during micro-and nanofiber pen scanning on the photoresist film. A two-step processs for fabricating the sharp and short MNFP is established by flamed-heated drawing and wet etching. The MNFP direct writing experiments are performed. The resolution of 200 nm line width is obtained,which is thinner than half of exposure wavelength (442 nm). The experiment results also show that MNFP direct writing can provide various widths of line by changing the radiation power.