• Spectroscopy and Spectral Analysis
  • Vol. 33, Issue 2, 527 (2013)
WANG Shao-peng1、*, FENG Guo-ying1, DUAN Tao2, and HAN Jing-hua3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.3964/j.issn.1000-0593(2013)02-0527-04 Cite this Article
    WANG Shao-peng, FENG Guo-ying, DUAN Tao, HAN Jing-hua. The Deposition of Elements in the Process of Laser Ablation of Silicon[J]. Spectroscopy and Spectral Analysis, 2013, 33(2): 527 Copy Citation Text show less
    References

    [1] Schuettler M, Stiess S, King B V, et al. Journal of Neural Engineering, 2005, 2(1): S121.

    [2] Shen Mengyan, James E Carey, Catherine H Crouch, et al. Nano Letters, 2008, 8(7): 2087.

    [3] Yang C, Wang Y, Xu X. International Journal of Heat and Mass Transfer, 2012, 55(21-22): 6060.

    [4] Chen Yanfeng, Chen Haiyan, Alex Aleksandrov, et al. Journal of Physical Chemistry C, 2008, 112(17): 6953.

    [5] Kumar Sinniah, Michael G Sherman, Lias B Lewis, et al. Physical Review Letters, 1989, 62: 567.

    [7] Wakaki M, Kudo K Shibuya T. Physical Properties and Data of Optical Materials (1st Ed.) (California: CRC Press), 2007. 86.

    [8] Tao S, Wu B, Zhou Y, et al. J. Applied Physics, 2009, 106: 123505.

    [9] Weber M J. Handbook of Optical Materials(1st Ed.) (California: CRC Press), 2003. 145.

    [10] D’Anna E, Luby S, Luches A, et al. Applied Physics A: Materials Science & Processing, 1993, 56: 429.

    [11] Wiese W L. Wavelengths and Transition Probabilities for Atoms and Atomic Ions, NSRDS-NBS 68(Washington D. C.: U. S. Government Printing Office). 1980.

    [12] U.S. Ref. Data Series, National Bureau of Standards. Washington DC, 1980. 68.

    WANG Shao-peng, FENG Guo-ying, DUAN Tao, HAN Jing-hua. The Deposition of Elements in the Process of Laser Ablation of Silicon[J]. Spectroscopy and Spectral Analysis, 2013, 33(2): 527
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