[1] V.NORKUS,G.GERALD,G.HOFMANN.Process technology for high-resolution infrared detectors based on LiTaO3[J].SPIE,1999,3892:233-240.
[2] Weiguo LIU,Jong Soo KO,Weiguang ZHU,Preparation and properties of multilayer Pb(Zr,Ti)O3/PbTi O3 thin films for pyroelectric application[J].Thin Solid Films,2000,371:254-258.
[3] H.V.ALEXANDRU,C.BERBECARU,F.STANCULESCU,et al.Doped TGS crystals for IR detection and sensors[J].Sensors and Actuators A,2004,113:387-392.
[4] E.BORMASHENKO,R.POGREB,Y.SOCOL,et al.Polyvinylidene fluoride-piezoelectric polymer for integrated infrared optics applications[J].Optical Materials,2004,27:429-434.
[5] C.PLEHNERT,V.NORKUS,S.M HLING,et al.Reactive ion beam etching of lithium tantalate and its application for pyroelectric infrared detectors[J].Surface and Coatings Technology,1995,75:932-936.
[6] B.JAFFE,W.R.COOK,H.L.JAFFE.Piezoelectric Ceramics[M].New York:Academic Press,1971.
[7] T.N.BLANTON,D.K.CHATTERJEE.An X-ray diffraction study of epitaxial lithium tantalate films deposited on (0001) sapphire wafers using r.f.diode sputtering[J].Thin Solid Films,1995,256(1-2):59-63.
[8] M.OZAKI,M.KANAI,T.KAWAI.Surface Acoustic Wave Properties of Lithium Tantalate Films Grown by Pulsed Laser Deposition[J].Jpn.J.Appl.Phs,1995,31:249-253.
[9] A.A.WERNBERG,G.H.BRAUNSTEIN,H.J.GYSLING.Improved solid phase epitaxial growth of lithium tantalite thin films on sapphire,using a two-step metalorganic chemical vapor deposition process[J].Appl.Phys.Lett,1993,63(19):2649-2651.
[10] De-Yin ZHANG,Da-Gui HUANG,Yan-Qiu HE.Intelligent Temperature Control Strategy For LiTaO3 Thin Film Deposition Process[A].Proceedings of 2004 International Conference on Intelligent Mechatronics and Automation[C].Chengdu,China:UESTC,2004.339-344.
[11] De-Yin ZHANG,Da-Gui HUANG,Zheng DONG.Preparation of Multi-layer LiTaO3 Infrared-Detected Functional Thin Film[J].SPIE,2005,6149:1-5.
[12] M.C.KAO,M.S.LEE,C.M.WANG,et al.Properties of LiTaO3 Thin Films Derived by a Diol-Based Sol-Gel Process[J].Jpn.J.Appl.Phys,2002,41:2982-2986.
[13] S.BAUER,B.PLOSS.A simple technique to interface pyroelectric materials with silicon substrates for infrared detection[J].Ferroelectrics Letters,1989,9:155-160.