The investigation of focusing characteristic based on double Bowtie nano-lithography structure

Jie Zheng; Xianchao Liu; Yuerong Huang; Yunyue Liu; Weidong Chen; Ling Li

doi:10.3969/j.issn.1003-501x.2017.02.011

Journals >Opto-Electronic Engineering >Volume 44 >Issue 2 >Page 240 > Article

Opto-Electronic Engineering
Vol. 44, Issue 2, 240 (2017)

The investigation of focusing characteristic based on double Bowtie nano-lithography structure

Jie Zheng¹, Xianchao Liu^1、2, Yuerong Huang¹, Yunyue Liu¹, Weidong Chen¹, and Ling Li¹

Author Affiliations

¹College of Physics and Electronic Engineering, Sichuan Normal University, Chengdu 610101, China

²School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China

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DOI: 10.3969/j.issn.1003-501x.2017.02.011 Cite this Article

Jie Zheng, Xianchao Liu, Yuerong Huang, Yunyue Liu, Weidong Chen, Ling Li. The investigation of focusing characteristic based on double Bowtie nano-lithography structure[J]. Opto-Electronic Engineering, 2017, 44(2): 240 Copy Citation Text

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