• Infrared and Laser Engineering
  • Vol. 44, Issue 10, 3010 (2015)
Ren Bin1、2、3, Shi Feng1、2, Guo Hui1、2, Jiao Gangcheng1、2, Hu Canglu1、2, Cheng Wei1、2, Xu Xiaobing1、2, and Wang Shufei1、2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: Cite this Article
    Ren Bin, Shi Feng, Guo Hui, Jiao Gangcheng, Hu Canglu, Cheng Wei, Xu Xiaobing, Wang Shufei. Design and calculation of absorption layer thickness on InP/InGaAs transferred-electron photocathode[J]. Infrared and Laser Engineering, 2015, 44(10): 3010 Copy Citation Text show less

    Abstract

    The electonic structure and optical properties of standard InGaAs material, which formed the absorption layer of transferred-electron InP/InGaAs photocathode, were studied based on the density functional theory, the exchange and correlation potential energy was described by Heyd-Scuseria-Ernzerh(HSE06). First, the energy band structure of zinc blende GaAs was verified with this hybrid density functional, then the standard InGaAs bulk model was established, and dynamically optimized by self-consistent method before complex dielectric function was obtained, then the optical absorption coefficient was derivated from Kramers-Kronig relation. Finally, under the estimation of P-type standard InGaAs unequilibrium minority carriers effusion length were 0.8, 1.0, 1.2, 1.4, 1.6 and 2.0 m separately, combined with quantum efficiency formula of transferred-electron photocathode, the optimized absorption layer thickness of InP/InGaAs photocathode was derivated according to the photon energy between 0.780 260 eV and 0.820 273 eV with spacing 0.002 eV.
    Ren Bin, Shi Feng, Guo Hui, Jiao Gangcheng, Hu Canglu, Cheng Wei, Xu Xiaobing, Wang Shufei. Design and calculation of absorption layer thickness on InP/InGaAs transferred-electron photocathode[J]. Infrared and Laser Engineering, 2015, 44(10): 3010
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