• Optoelectronics Letters
  • Vol. 12, Issue 4, 249 (2016)
Ming-sheng XU1, Heng ZHANG2, Quan-bin ZHOU1, and Hong WANG1、*
Author Affiliations
  • 1Engineering Research Center for Optoelectronics of Guangdong Province, School of Physics and Optoelectronics, South China University of Technology, Guangzhou 510641, China
  • 2State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, China
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    DOI: 10.1007/s11801-016-6075-5 Cite this Article
    XU Ming-sheng, ZHANG Heng, ZHOU Quan-bin, WANG Hong. Effects of p-type GaN thickness on optical properties of GaN-based light-emitting diodes[J]. Optoelectronics Letters, 2016, 12(4): 249 Copy Citation Text show less

    Abstract

    The influence of p-type GaN (pGaN) thickness on the light output power (LOP) and internal quantum efficiency (IQE) of light emitting diode (LED) was studied by experiments and simulations. The LOP of GaN-based LED increases as the thickness of pGaN layer decreases from 300 nm to 100 nm, and then decreases as the thickness decreases to 50 nm. The LOP of LED with 100-nm-thick pGaN increases by 30.9% compared with that of the conventional LED with 300-nm-thick pGaN. The variation trend of IQE is similar to that of LOP as the decrease of GaN thickness. The simulation results demonstrate that the higher light efficiency of LED with 100-nm-thick pGaN is ascribed to the improvements of the carrier concentrations and recombination rates.
    XU Ming-sheng, ZHANG Heng, ZHOU Quan-bin, WANG Hong. Effects of p-type GaN thickness on optical properties of GaN-based light-emitting diodes[J]. Optoelectronics Letters, 2016, 12(4): 249
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