Compact Polarized Spectrometer Based On Spatial Modulation of Polarization State

TAO Ze; LIU Jia-Min; ZHANG Chuan-Wei; CHEN Xiu-Guo; JIANG Hao; LIU Shi-Yuan

doi:10.11972/j.issn.1001-9014.2016.05.009

[1] FUJIWARA H. Spectroscopic ellipsometry principles and applications[M]. New York: Wiley, 2007, 93-94.

[2] BRACCO G, HOLST B. Surface science techniques[M]. Berlin: Springer-Verlag, 2013, 99-101.

[3] AZZAM R M A, BASHARA N M. Ellipsometry and polarized light[M]. Amsterdam: North-Holland Publishing Company, 1977, 153-156.

[4] AZZAM, R M. Two-reflection null ellipsometer without a compensator[J]. Journal of physics E: Scientific instruments 1975, 9: 596-572.

[5] CHEN Liang-Yao, DAVID W L. Scanning ellipsometer by rotating polarizer and analyzer[J]. Appl. Optics, 1987, 26(24): 5221-5238.

[6] STOYAN C R, TZANIMIR V A. Rotating analyzer–fixed analyzer ellipsometer based on null type ellipsometer[J]. Rev. Sci. Instrum., 1999 , 70(7): 3077-3083.

[7] COLLINS R W, JOOHYUN K. Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films[J]. J. Opt. Soc. Am. A, 1999, 16(8): 1997-2006.

[8] LIU Shi-Yuan, CHEN Xiu-Guo, ZHANG Chuan-Wei. Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology[J]. Thin Solid Films, 2015, 584: 176-185.

[9] JELLISON G E, JR., MODINE F A. Two-modulator generalized ellipsometry: theory[J]. Appl. Optics, 1997, 36(31): 8190-8198.

[10] ASPNES D E. Spectroscopic ellipsometry——Past, present, and future[J]. Thin Solid Films, 2014, 571: 334-344.

[11] CHEN Xiu-Guo, ZHANG Chuan-Wei, LIU Shi-Yuan. Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry[J]. Appl. Phys. Lett., 2013,103(151605): 1-4.

[12] CHEN Xiu-Guo, ZHANG Chuan-Wei, LIU Shi-Yuan, et al. Mueller matrix ellipsometric detection of profile asymmetry in nanoimprinted grating structures[J]. J. Appl. Phys., 2014, 116(194305): 1-7.

[13] RODENHAUSEN K B, SCHMIDT D, KASPUITS T, et al. Generalized ellipsometry in-situ quantification of organic adsorbate attachment within slanted columnar thin films[J]. Opt. Express, 2012, 20(5): 5419-5428.

[14] TAKASHI S, TAKESHI A, YOSHIHIRO S, et al. Compact ellipsometer employing a static polarimeter module with arrayed polarizer and wave-plate elements[J]. Appl. Opt., 2007, 46(22):4963-4967.

[15] SANG H Y, SOO H K, YOON K K, et al Angle-resolved annular data acquisition method for microellipsometry[J]. Opt. Express, 2007,15(26):18056-18065.

[16] KOOPS R, SONIN P,VEGHEL M V, et al. A compact new-concept ellipsometer for accurate large scale thin film measurements[J]. J. Opt., 2014, 16(065701): 1-9.

[17] KAZAMA A, YAMADA Y, YAMADA T, et al. Compact and high-speed ellipsometer[J]. Proc. SPIE, 1992, 1681:183-188.

[18] MAO Peng-Hui, ZHENG Yu-Xiang, CHEN Yue-Rui, et al. Study of the new ellipsometric measurement method using integrated analyzer in parallel mode[J]. Opt. Express, 2009, 17(10):8641-8650.

[19] Al-ASSAAD R M, BYRNE D M. Error analysis in inverse scatterometry. I. modeling[J]. J. Opt. Soc. Am. A, 2007, 24(2):326-338.

[20] STEPHEN A C. The science and engineering of microelectronic fabrication[M]. New York: Oxford University Press, 2001.

[21] WUBBELER G, KRYSTEK M, ELSTER C. Evaluation of measurement uncertainty and its numerical calculation by a Monte Carlo method[J]. Meas. Sci. Technol., 2008, 19(084009): 1-4.