• Acta Optica Sinica
  • Vol. 26, Issue 6, 938 (2006)
[in Chinese]*, [in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • [in Chinese]
  • show less
    DOI: Cite this Article Set citation alerts
    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Electrochromism of WO3 Films Deposited by Mid-Frequency Dual-Target Magnetron Sputtering Method[J]. Acta Optica Sinica, 2006, 26(6): 938 Copy Citation Text show less
    References

    [2] C. G. Granqvist, E. Avendano, A. Azens. Electrochromic coatings and devices: survey of some recent advances[J]. Thin Solid Films, 2003, 442(1~2): 201~211

    [3] E. Washizu, A. Yamamoto, Y. Abe et al.. Optical and electrochromic properties of RF reactively sputtered WO3 films[J]. Solid State Ionics, 2003, 165(1~4): 175~180

    [4] Z. Dimitrova, D. Gogova. On the structure, stress and optical properties of CVD tungsten oxide films[J]. Materials Research Bulletin, 2005, 40(`2): 333~340

    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Electrochromism of WO3 Films Deposited by Mid-Frequency Dual-Target Magnetron Sputtering Method[J]. Acta Optica Sinica, 2006, 26(6): 938
    Download Citation