• Opto-Electronic Engineering
  • Vol. 39, Issue 10, 54 (2012)
LEI Liang*, OUYANG Qin, and SHI Ying
Author Affiliations
  • [in Chinese]
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    DOI: 10.3969/j.issn.1003-501x.2012.10.009 Cite this Article
    LEI Liang, OUYANG Qin, SHI Ying. The Analysis of Phase-only Matched Filtering and Application on Projection Lithography[J]. Opto-Electronic Engineering, 2012, 39(10): 54 Copy Citation Text show less
    References

    [1] LIN K, JAIN K. Design and Fabrication of Stretchable Multilayer Self-Aligned Interconnects for flexible Electronics and Large-Area Sensor Arrays Using Excimer Laser Photoablation [J]. IEEE Electron Device Letters (S0741-3106), 2009, 30(1): 14-17.

    [2] ZIMMERMANN M, LINDLEIN N, VOELKEL R, et al. Microlens laser beam homogenizer: from theory to application [J]. Proc. of the SPIE (S0277-786X), 2007, 6663(1): 1-13.

    [5] KATAGIRI S, MORIYAMA S, TERASAWA T, et al. Novel alignment technique for 0.1-micron lithography using the wafer rear surface and canceling tilt effect [J]. Optical Engineering(S0091-3286), 2004, 32(10): 2344-2349.

    [7] HORNER J, GIANINO P. Phase-only matched filtering [J]. Applied Optics(S0003-6935), 1984, 23(16): 812-816.

    LEI Liang, OUYANG Qin, SHI Ying. The Analysis of Phase-only Matched Filtering and Application on Projection Lithography[J]. Opto-Electronic Engineering, 2012, 39(10): 54
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