[2] Eliasson B, Kogelschatz U. IEEE Trans. Plasma Science, 1991, 19(2): 309.
[3] Massines F, Gherardi N, Naude N, et al. Eur. Phys. J. Appl. Phys., 2009, 47: 22805.
[4] Takaki K, Fujiwara T. IEEE Trans. on Plasma Science, 2001, 29(3): 518.
[5] Li X C, Jia P Y, Yuan N, et al. Phys. Plasmas, 2011, 18: 043505.
[6] Laroussi M, Lu X. Applied Physics Letters, 2005, 87(11): 113902.
[7] Yang D Z, Yang Y, Li S Z, et al. Plasma Sources Science and Technology, 2012, 21: 035004.
[8] Uhm H S, Lim J P, Li S Z. Appl. Phys. Lett., 2007, 90(26): 261501.
[9] Moravej M, Yang X, Hicks R F, et al. Journal of Applied Physics, 2006, 99(9): 093305.
[10] Shirai H, Kobayashi T, Hasegawa Y. Appl. Phys. Lett., 2005, 87: 143112.
[11] Li S Z, Huang W T, Zhang J L, et al. Appl. Phys. Lett., 2009, 94: 111501.
[12] Park H D, Dhali S K. Appl. Phys. Lett., 2000, 77(14): 2112.
[13] Merbahi N, Sewraj N, Marchal, et al. J. Phys. D: Appl. Phys., 2004, 37(12): 1664.
[14] Kozlov K V, Wagner H E, Brandenburg R, et al. J. Phys. D: Appl. Phys., 2001, 34(21): 3164.