LI SHIFANG, YIN LIFENG, HU QIQUAN, ZHANG YANPING, LIN FUCHENG. Optogalvanic effect of ArII in HCD[J]. Acta Optica Sinica, 1985, 5(8): 679
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An experimental investigation of the optogalvanio effect of ArII in an HOD lamp by using an Ar+ laser, with its Ising line at 514.5nm, 496.5nm, and 476.5nm separately is reported. By considering various effects, such as ionization, recombination, and other mechanism of excited ions, we propose a simplified model which can be used to explain experimental results satisfactorily. The possibility of measuring some parameters of discharge plasmas in low-possibility of measuring optogalvanio effect is also suggested.