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    Journals >Acta Optica Sinica >Volume 38 >Issue 9 >Page 0912002 > Article
    • Acta Optica Sinica
    • Vol. 38, Issue 9, 0912002 (2018)
    Focus Control Technology in Immersion Lithography
    Chen Duan1、2、3、*, Mingcheng Zong1、2、3、*, Wei Fan1、2、3, and Lulu Meng1、3
    Author Affiliations
  • 1 Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • 2 University of Chinese Academy of Sciences, Beijing 100049, China
  • 3 Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics,Chinese Academy of Sciences, Beijing 100029, China;
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    DOI: 10.3788/AOS201838.0912002 Cite this Article Set citation alerts
    Chen Duan, Mingcheng Zong, Wei Fan, Lulu Meng. Focus Control Technology in Immersion Lithography[J]. Acta Optica Sinica, 2018, 38(9): 0912002 Copy Citation Text show less
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    Chen Duan, Mingcheng Zong, Wei Fan, Lulu Meng. Focus Control Technology in Immersion Lithography[J]. Acta Optica Sinica, 2018, 38(9): 0912002
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    Paper Information
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