• Opto-Electronic Engineering
  • Vol. 40, Issue 2, 100 (2013)
DENG Yafei*, ZHOU Jinyun, LEI Liang, RAN Zuo, and ZHOU Yamei
Author Affiliations
  • [in Chinese]
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    DOI: 10.3969/j.issn.1003-501x.2013.02.016 Cite this Article
    DENG Yafei, ZHOU Jinyun, LEI Liang, RAN Zuo, ZHOU Yamei. Novel Projection Lens Design for Large-area PCB Lithography[J]. Opto-Electronic Engineering, 2013, 40(2): 100 Copy Citation Text show less
    References

    [2] WANG Feng-tao, LIU Fu-han, KONG Ling-hua. Proximity Lithography in Sub-10 Micron Circuitry for Packaging Substrate [J]. IEEE Transaction on Advanced Packaging, 2010, 33(4): 876-882.

    [3] Jain K. A Large-Area High-Throughput High-Resolution Projection Imaging System: US, 5285236 [P]. 1994-08.

    [8] Joseph M Geary. Introduction to Lens Design: With Practical ZEMAX Examples [M]. Willmann-Bell, Inc, 2002: 365-372.

    [9] Plummer J D. Silicon VLSI Technology Fundamentals, Practice and Modeling [M]. Prentice Hall, 2003: 688-742.

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    DENG Yafei, ZHOU Jinyun, LEI Liang, RAN Zuo, ZHOU Yamei. Novel Projection Lens Design for Large-area PCB Lithography[J]. Opto-Electronic Engineering, 2013, 40(2): 100
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