Nonpolar ZnO films of high crystallization have been prepared by metal organic chemical vapor phase deposition on LiGaO2 (100) substrates. Effect of substrate temperature on the crystallization of ZnO films is investigated. X-ray diffraction (XRD) results indicated that high quality nonpolar ZnO films are obtained at 500 ℃. The surface morphologic image and crystal size are observed by atomic force microscope (AFM). The ZnO film deposited at 500 ℃ shows a smoother and uniform morphologic image, the root mean square (RMS) value roughness is 0.626 nm. According to the photoluminoscence (PL) spectra, the near band emission peaks of the ZnO films are located at 375 nm. However, the yellow emission is stronger when the film is deposited at 400 ℃, inferring that the crystallization property of ZnO film is poor at lower temperature, and there are more defects in the film.