Study on fabrication of gray-scale mask for diffractive optical elements

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 31 >Issue 10 >Page 21 > Article

Opto-Electronic Engineering
Vol. 31, Issue 10, 21 (2004)

Study on fabrication of gray-scale mask for diffractive optical elements

[in Chinese]¹, [in Chinese]², [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, and [in Chinese]¹

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¹[in Chinese]

²[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on fabrication of gray-scale mask for diffractive optical elements[J]. Opto-Electronic Engineering, 2004, 31(10): 21 Copy Citation Text

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References

[3] DASCHNER W,LONG P,STEIN R,et al.Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass [J].Applied Optics,1997,36(20):4675-4680.

[4] SULESKI T J,O'SHEA D C.Gray-scale masks for diffractive-optics fabrication:I.Commercial slide imagers[J].Applied Optics,1995,34(32):7507-7526.

[5] SHRAUGER V E,ERWIN L L,AHN J L,et al.Computer-generated multiple-phase-level holograms by use of color-printer techniques [J].Applied Optics,1994,33(23):5318-5327.

[6] WANG M R,SU H.Laser direct-write gray-level mask and one-step etching for diffractive microlens fabrication [J].Applied Optics,1998,37(32):7568-7576.

[7] BLAIR P,TAGHIZAEDH M R,PARKES W,et al.High-efficiency binary fan-out grating by modulation of a high-frequency carrier grating [J].Applied Optics,1995,34(14):2406-2412.

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