[1] Chang T Y. Improved uniform-field electrode profiles for TEA laser and high voltage applications[J]. Rev Sci Instr,1973, 44(4): 405407.

[2] Anufrik S S, Volodenkov A P, Znosko K F. Influence of the preionization system on the lasing energy of a XeCl laser[J]. J Opt Technol, 2000, 67(11): 961967.

[3] Wang Xiaoshun，Yu Yinshan，Wang Qingsheng, et al. A discharge pumped KrF exicmer laser with high efficiency[J]. Chinese Journal of Lasers, 2011, 38(1): 1-5. (in Chinese)

[4] Mark J Kushner. Microarcs as a termination mechanism of optical pulses in electric-discharge excited KrF excimer lasers[J]. IEEE Tran Pias, 1991, 19: 387-399.

[5] Toru Mizunami, Keiji Takagi. Buffer gas effect in a discharge-pumped XeBr excimer laser[J]. J Appl Phys, 1992, 71(4): 20362038.

[6] Bagayev S N, Razhev A M, Zhupikovet A A, et al. 1.3 J KrF excimer laser with efficiency 2.5%[C]//SPIE, 2003, 5120:231235.

[7] Fahlen T. Efficient quarter-joule KrF laser with corona preionization[J]. IEEE Journal of Quantum Electronics, 1979, 15(5): 311-313.

[8] Wang C. Performance of XeF/KrF lasers pumped by fast discharges [J]. Applied Physics Letters, 1976, 29(2): 103-105.

[9] Ewing J, Brau C A. Laser action on the 2Σ+1/2→2Σ+1/2 bands of KrF and XeCl[J]. Applied Physics Letters, 1975, 27(6): 350-352.

[10] Witteman W, Oomen G. On the performance of an e-beam pumped KrF laser [J]. Optics Communications, 1980, 32(3): 467-472.

[11] Gerber T, Peters P, Bastiaens H, et al. Enhancement of the specific output energy of an electron-beam pumped KrF laser by using Ne as the main buffer gas [J]. Applied Physics Letters, 1984, 45(4): 356-357.

[12] Ch K Rhodes. Excimer Lasers[M]. New York: Springer-Verlag, 1984: 97100.

[13] Liu Jingru, Yi Aiping, Hu Zhiyun, et al. Excimer Laser Technology and Pplications[M]. Beijing: National Defense Industry Press, 2009: 7578. (in Chinese)