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Journals >Opto-Electronic Engineering >Volume 31 >Issue z1 >Page 67 > Article

Opto-Electronic Engineering
Vol. 31, Issue z1, 67 (2004)

Uniformity of optical film prepared by ion beam sputtering

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]^1、2, and [in Chinese]¹

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¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Uniformity of optical film prepared by ion beam sputtering[J]. Opto-Electronic Engineering, 2004, 31(z1): 67 Copy Citation Text

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References

[2] DEMIRYONT H ,SITES J R ,GEIB K .Effects of oxygen content on the properties of tantalum oxide films deposited by ion beam sputtering [J]. Appl, Opt, 1985, 24: 490-495.

CLP Journals

[1] FENG Shi, FU Xiu-hua, WANG Da-sen, LI Xiao-jing, NIE Feng-ming, ZHANG Xu. Study on Planarization Layer Uniformity of Large-aperture Optical Elements Based on Ion Beam Sputtering[J]. Acta Photonica Sinica, 2019, 48(1): 131002

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Uniformity of optical film prepared by ion beam sputtering[J]. Opto-Electronic Engineering, 2004, 31(z1): 67

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