Nanoimprint lithography (NIL) is a nano-size scale fabrication technology which could fabricate patterns mechanically with such advantages as simple machines, easy operation, good repeatability and low costs. Meanwhile, it can achieve precise nanopatterns on whole 2-inch or 4-inch wafers (1 inch=25.4 mm), which makes it possible to fabricate nano-size optoelectronic devices with high throughput and low costs. On the other hand, solid state lighting using compound semiconductor materials is an attractive field both in academia and industry of the world. High-efficiency light-emitting diodes (LED) are taking place of traditional lighting sources，in order to realize high-quality, green lighting. This review covers the basic principles and process of nanoimprinting, with an emphasis on the application of nanoimprinting for the new inorganic and organic LED, achieving the nano-LED structures and photonic crystals to improve the efficiency of optoelectronic devices.