• Opto-Electronic Engineering
  • Vol. 42, Issue 6, 50 (2015)
CHEN Huanan*, GUO Kang, ZHANG Linghua, LIU Jian, and SHANG Hongbo
Author Affiliations
  • [in Chinese]
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    DOI: 10.3969/j.issn.1003-501x.2015.06.009 Cite this Article
    CHEN Huanan, GUO Kang, ZHANG Linghua, LIU Jian, SHANG Hongbo. Designing for Flexure-based X-Y Adjusting Mechanism of Lithograph Projection Objective[J]. Opto-Electronic Engineering, 2015, 42(6): 50 Copy Citation Text show less
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    [2] DENG Yafei, ZHOU Jinyun, LEI Liang, et al. Novel projection lens design for large-area PCB lithography [J]. Opto-Electronic Engineering, 2013, 40(2): 100-104.

    [3] SUN Zhen, GONG Yan. Design of V-flexure axial adjusting mechanism of lithograph projection objective [J]. Laser & Optoelectronics Progress, 2013, 50: 101101.

    [4] GUO Kang, GONG Yan. Effect of adjusting force on surface figure of optical element in axial adjustment mechanism [J]. Acta Optica Sinica, 2013, 33(11): 1123001.

    [5] GUO Kang, GONG Yan. Precise axial adjustment mechanism with 6-PSS type of optical elements [J]. Optics and Precision Engineering, 2013, 21(10): 2648-2653.

    [6] RYU J W, GWEON D, MOON K S. Optimal design of a flexure hinge based XYφ wafer stage [J]. Precision Engineering (S0141-6359), 1997, 21(1): 18-28.

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    [8] CHEN Guimin, LI Duanling. Degree of freedom of planar compliant mechanisms [J]. Journal of Mechanical Engineering, 2010, 46(13): 48-52.

    [9] ZHAO Lei, GONG Yan, ZHAO Yang. Flexure-based X-Y micro-motion mechanism used in lithographic lens [J]. Optics and Precision Engineering, 2013, 21(6): 1426-1432.

    [10] NI Mingyang, GONG Yan. Transmission ratio analysis for a lateral adjustment barrel in DUV projection lens [J]. Infrared and Laser Engineering, 2012, 41(12): 3323-3328.

    [11] PENG Haifeng, GONG Yan, ZHAO Lei. Performance index analysis of the support of lithographic lens with multi flexural brackets [J]. Opto-Electronic Engineering, 2013, 40(2): 71-75.

    CHEN Huanan, GUO Kang, ZHANG Linghua, LIU Jian, SHANG Hongbo. Designing for Flexure-based X-Y Adjusting Mechanism of Lithograph Projection Objective[J]. Opto-Electronic Engineering, 2015, 42(6): 50
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