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    Journals >Laser & Optoelectronics Progress >Volume 48 >Issue 1 >Page 11601 > Article
    • Laser & Optoelectronics Progress
    • Vol. 48, Issue 1, 11601 (2011)
    Simulation on Substrate Relative Dilution Ratio for GH4033
    Chen Gang1、*, Li Xiangfeng1, Zuo Dunwen1, Wang Hongyu1、2, and Zhang Min1
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  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop48.011601 Cite this Article Set citation alerts
    Chen Gang, Li Xiangfeng, Zuo Dunwen, Wang Hongyu, Zhang Min. Simulation on Substrate Relative Dilution Ratio for GH4033[J]. Laser & Optoelectronics Progress, 2011, 48(1): 11601 Copy Citation Text show less
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    Chen Gang, Li Xiangfeng, Zuo Dunwen, Wang Hongyu, Zhang Min. Simulation on Substrate Relative Dilution Ratio for GH4033[J]. Laser & Optoelectronics Progress, 2011, 48(1): 11601
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