• Journal of Semiconductors
  • Vol. 42, Issue 8, 082802 (2021)
Sheng Yang1、2、3, Xiaowen Liang1、2、3, Jiangwei Cui1、2, Qiwen Zheng1、2, Jing Sun1、2, Mohan Liu1、2, Dang Zhang1、2, Haonan Feng1、2、3, Xuefeng Yu1、2, Chuanfeng Xiang1、2, Yudong Li1、2, and Qi Guo1、2
Author Affiliations
  • 1Key Laboratory of Functional Materials and Devices for Special Environments, Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Urumqi 830011, China
  • 2Xinjiang Key Laboratory of Electronic Information Material and Device, Urumqi 830011, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.1088/1674-4926/42/8/082802 Cite this Article
    Sheng Yang, Xiaowen Liang, Jiangwei Cui, Qiwen Zheng, Jing Sun, Mohan Liu, Dang Zhang, Haonan Feng, Xuefeng Yu, Chuanfeng Xiang, Yudong Li, Qi Guo. Impact of switching frequencies on the TID response of SiC power MOSFETs[J]. Journal of Semiconductors, 2021, 42(8): 082802 Copy Citation Text show less
    Potential application examples using SiC devices at various voltage and frequency levels[15].
    Fig. 1. Potential application examples using SiC devices at various voltage and frequency levels[15].
    (Color online) SiC power MOSFET. (a) Variation in threshold voltage with the total ionizing dose at ON, OFF, and different frequencies. (b) Relation between the change in threshold voltage and applied switching frequency under the same total ionizing dose.
    Fig. 2. (Color online) SiC power MOSFET. (a) Variation in threshold voltage with the total ionizing dose at ON, OFF, and different frequencies. (b) Relation between the change in threshold voltage and applied switching frequency under the same total ionizing dose.
    (Color online) SiC power MOSFETs at ON, OFF, and different frequencies. (a) Variation in drain–source leakage current with the total ionizing dose. (b) Change in breakdown voltage with the total ionizing dose.
    Fig. 3. (Color online) SiC power MOSFETs at ON, OFF, and different frequencies. (a) Variation in drain–source leakage current with the total ionizing dose. (b) Change in breakdown voltage with the total ionizing dose.
    A model hole trapping [(a) to (b)] and detrapping [(c) to (a)] processes are indicated, along with the intermediate compensation/reverse-annealing phenomenon [(b) to (c) and (c) to (b)][18].
    Fig. 4. A model hole trapping [(a) to (b)] and detrapping [(c) to (a)] processes are indicated, along with the intermediate compensation/reverse-annealing phenomenon [(b) to (c) and (c) to (b)][18].
    (Color online) Comparison of threshold voltage of SiC Power MOSFETs with the total ionizing dose under 15 and 0 V segment gate bias, constant 0 V gate bias, and constant 15 V gate bias.
    Fig. 5. (Color online) Comparison of threshold voltage of SiC Power MOSFETs with the total ionizing dose under 15 and 0 V segment gate bias, constant 0 V gate bias, and constant 15 V gate bias.
    Sheng Yang, Xiaowen Liang, Jiangwei Cui, Qiwen Zheng, Jing Sun, Mohan Liu, Dang Zhang, Haonan Feng, Xuefeng Yu, Chuanfeng Xiang, Yudong Li, Qi Guo. Impact of switching frequencies on the TID response of SiC power MOSFETs[J]. Journal of Semiconductors, 2021, 42(8): 082802
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