Studv of a 20W XeCl excimer laser with hij h stability and high efficiency

Yu Yinshan; Wang Huasheng; Li Guangyin; Zhang Zhijiing; Wang Jianye

Journals >Chinese Journal of Lasers >Volume 16 >Issue 8 >Page 487 > Article

Chinese Journal of Lasers
Vol. 16, Issue 8, 487 (1989)

Studv of a 20W XeCl excimer laser with hij h stability and high efficiency

Yu Yinshan, Wang Huasheng, Li Guangyin, Zhang Zhijiing, and Wang Jianye

Author Affiliations

[in Chinese]

show less

DOI: Cite this Article Set citation alerts

Yu Yinshan, Wang Huasheng, Li Guangyin, Zhang Zhijiing, Wang Jianye. Studv of a 20W XeCl excimer laser with hij h stability and high efficiency[J]. Chinese Journal of Lasers, 1989, 16(8): 487 Copy Citation Text

show less

References

[2] Gary Klanminer, Laser & AppIIatiooa, September1986, 75

[3] Μ. Hiramatsu, Τ. Goto.Rev Sci. Instrum., 57 (4)534(1986)

Yu Yinshan, Wang Huasheng, Li Guangyin, Zhang Zhijiing, Wang Jianye. Studv of a 20W XeCl excimer laser with hij h stability and high efficiency[J]. Chinese Journal of Lasers, 1989, 16(8): 487

Download Citation

Set citation alerts for the article

Tools

Set citation alerts for the article

Save the article for my favorites

Paper Information