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    Journals >Chinese Journal of Lasers >Volume 16 >Issue 8 >Page 487 > Article
    • Chinese Journal of Lasers
    • Vol. 16, Issue 8, 487 (1989)
    Studv of a 20W XeCl excimer laser with hij h stability and high efficiency
    Yu Yinshan, Wang Huasheng, Li Guangyin, Zhang Zhijiing, and Wang Jianye
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    Yu Yinshan, Wang Huasheng, Li Guangyin, Zhang Zhijiing, Wang Jianye. Studv of a 20W XeCl excimer laser with hij h stability and high efficiency[J]. Chinese Journal of Lasers, 1989, 16(8): 487 Copy Citation Text show less

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    Yu Yinshan, Wang Huasheng, Li Guangyin, Zhang Zhijiing, Wang Jianye. Studv of a 20W XeCl excimer laser with hij h stability and high efficiency[J]. Chinese Journal of Lasers, 1989, 16(8): 487
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    Paper Information
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