Shihuan Shen, Yanqiu Li, Jiahua Jiang, Yan Liu, Ke Liu, Lihui Liu. Graded Multilayer Film Design for Anamorphic Magnification EUV Lithographic Objective[J]. Acta Optica Sinica, 2017, 37(8): 0822002
- Acta Optica Sinica
- Vol. 37, Issue 8, 0822002 (2017)
Fig. 1. Schematic of Mo/Si multilayer films. (a) Normalized multilayer film; (b) laterally graded multilayer film; (c) depth graded multilayer film
Fig. 2. Flow chart of laterally and depth graded multilayers combined method
Fig. 3. Layout of objective
Fig. 4. Off-axis image field and F1-F15 field points
Fig. 5. Reflectivity versus incidence angle of normalized multilayer film for mirrors.(a) M1~M3; (b) M4~M6
Fig. 6. Reflectivity distribution of mirrors with coating (M1~M6) in the center of the field of view F2
Fig. 7. Reflectivity distribution and wavefront aberration distribution of the system. (a) F2, reflectivity; (b) F15, reflectivity; (c) F2, wavefront aberration; (d) F15, wavefront aberration
Fig. 8. Thickness distribution of mirrors M2 and M3 depth graded multilayer films. (a) M2; (b) M3
Fig. 9. Reflectivity versus incidence angle of depth graded multilayer film for mirrors M2 and M3
Fig. 10. Reflectivity distribution of mirrors M2 and M3. (a) M2; (b) M3
Fig. 11. Reflectivity distribution and wavefront aberration distribution of the system. (a) F2, reflectivity; (b) F15, reflectivity; (c) F2, wavefront aberration; (d) F15, wavefront aberration
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Table 1. Main design specifications of projective objective
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Table 2. Incident angles of projection objective system
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Table 3. Gradient parameters of laterally graded multilayer films
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Table 4. Wavefront aberration and Strehl ratio of the systems without coating and with coating
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