Author Affiliations
1Key Laboratory of Adaptive Optics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China2Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China3University of Chinese Academy of Sciences, Beijing 100049, Chinashow less
Fig. 1. Schematic of Cartesian coordinate system and relative position relationship between segment and mask
Fig. 2. Far field patterns without gap and mask decenter, corresponding to different piston errors. (a) 0; (b) π/11; (c) 2π/11; (d) 3π/11; (e) 4π/11; (f) 5π/11; (g) 6π/11; (h) 7π/11; (i) 8π/11; (j) 9π/11; (k) 10π/11
Fig. 3. Far field patterns from mask with different piston and gap, but without decenter. kδ equals (a) 0; (b) π/11; (c) 2π/11; (d) 3π/11; (e) 4π/11; (f) 5π/11; (g) 6π/11; (h) 7π/11; (i) 8π/11; (j) 9π/11; (k) 10π/11
Fig. 4. Intensity distributions for different gaps in vertical direction when kδ=6π/11
Fig. 5. Far field patterns from mask with different piston and decenter, but without gap. kδ equals (a) 0; (b) π/11;(c) 2π/11; (d) 3π/11; (e) 4π/11; (f) 5π/11; (g) 6π/11; (h) 7π/11; (i) 8π/11; (j) 9π/11; (k) 10π/11
Fig. 6. Correlation coefficients between templates
Fig. 7. Correlation coefficients between templates and far field patterns of mask with different gap and piston. gratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9
Fig. 8. Correlation coefficients between templates and far field patterns of mask with different gap. gratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9
Fig. 9. Matching results between templates and far field patterns of mask with different gap. gratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9
Fig. 10. Correlation coefficients between templates and far field patterns of mask with different decenter and piston. Δyratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9
Fig. 11. Correlation coefficients between templates and far field patterns of mask with different decenter.Δyratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9
Fig. 12. Matching results between templates and far field patterns of mask with different decenter. Δyratio equals (a) 0.1; (b) 0.2; (c) 0.3; (d) 0.4; (e) 0.5; (f) 0.6; (g) 0.7; (h) 0.8; (i) 0.9