[2] Kogelschatz U. Plasma Chemistry and Plasma Processing, 2003, 23(1): 1.
[3] Boffard J B, Jung R O, Lin C C, et al. Plasma Sources Science and Technology, 2009, 18(3): 035017.
[4] Isola L M, López M, Cruceo, et al. Plasma Sources Sci. Technology, 2014, 23(1): 015014.
[5] Matsuo S, Kiuchi M. Japanese Journal of Applied Physics, 1983, 22(4): L210.
[8] Hoang T D, Vladimir S, Rainer H. New Journal of Physics, 2009, 11(3): 033020.
[9] Hayashi Y, Hirao S, Zhang Y, et al. Journal of Physics D: Applied Physics, 2009, 42(14): 145206.
[10] Miura N, Xue J, Hopwood J A. Transactions on Plasma Science, 2010, 38(9): 2458.
[11] Williamson J M, Bletzinger P, Ganguly B N. J. Phys. D: Appl. Phys., 2004, 37(12): 1658.
[12] Hübner S, Sadeghi N, Carbone E A D, et al. Journal of Applied Physics, 2013, 113(14): 143306.
[14] Liu W Y, Xu Y, Liu Y X, et al. Physics of Plasmas, 2014, 21(10): 103501.
[15] Mitchell A. Resonance and Radiation and Excited Atoms. Cambridge, U. K.: Cambridge Univ. Press, 1971.
[16] http://physics.nist.gov/PhysRefData/ASD/lines_form.html.
[18] Van Dyck Jr R S, Johnson C E, Shugart H A. Physical Review A, 1972, 5 (2): 991.
[19] Mcmillin B K, Zachariah M. Journal of Applied Physics, 1996, 79(1): 77.