Experimental Research of Ultraviolet LED Source System in Stereolithography Apparatus

XIE Jun; YOU Li-de; HOU Wen-jie

Journals >Opto-Electronic Engineering >Volume 36 >Issue 2 >Page 100 > Article

Opto-Electronic Engineering
Vol. 36, Issue 2, 100 (2009)

Experimental Research of Ultraviolet LED Source System in Stereolithography Apparatus

XIE Jun, YOU Li-de, and HOU Wen-jie

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[in Chinese]

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DOI: Cite this Article

XIE Jun, YOU Li-de, HOU Wen-jie. Experimental Research of Ultraviolet LED Source System in Stereolithography Apparatus[J]. Opto-Electronic Engineering, 2009, 36(2): 100 Copy Citation Text

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References

[1] WU Mao-liang，LI Di-chen，ZHAO Wan-hua，et al. Research and Development of Ultra Violet(UV) Light Prototyping System[J]. China Mechanical Engineering，2000，11(10)：1120-1123.

[2] Chartier T，Hinczewski C，Corbel S. UV Curable systems for tape casting [J]. Journal of the European Ceramic Society (S0955-2219)，1999，19：67-74.

[3] XU Guang-shen，ZHAO Wan-hua，TANG Yi-ping，et al. Novel stereolithography system for small size objects [J]. Rapid Prototyping Journal(S1355-2546)，2006，12(1)：12-17.

[4] Neamen Donald A. An Introduction to Semiconductor Devices [M]. Beijing：Tsinghua University Press，2006：616-621.

[5] ZEMAX Development Corporation. Zemax Optical Design Program [Z].

[6] XIE Jun，YOU Li-de，MO Jian-hua，et al. A UV LED Focusing Apparatus Used in Stereolithography Apparatus：China，200610019778.2 [P]. 2008-10-8.

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XIE Jun, YOU Li-de, HOU Wen-jie. Experimental Research of Ultraviolet LED Source System in Stereolithography Apparatus[J]. Opto-Electronic Engineering, 2009, 36(2): 100

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