• Microelectronics
  • Vol. 52, Issue 3, 437 (2022)
CAO Qianlong1、2、3, WU Qiannan1、3、4, ZHU Guangzhou1、2、3, CHEN Yu1、2、3, WANG Junqiang1、2、3, and LI Mengwei1、2、3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • 4[in Chinese]
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    DOI: 10.13911/j.cnki.1004-3365.210367 Cite this Article
    CAO Qianlong, WU Qiannan, ZHU Guangzhou, CHEN Yu, WANG Junqiang, LI Mengwei. Design of a Four Port Electronic Calibrator Based on RF MEMS Switch[J]. Microelectronics, 2022, 52(3): 437 Copy Citation Text show less
    References

    [1] REBEIZ G M,MULDAVIN J B,SCHOENLINNER B, et al. RF MEMS: theory, design, and technology [M]. John Wiley & Sons, Inc., 2003.

    [13] RIEKKINEN T, MOLARIUS J, LAURILA T, et al. Reactive sputter deposition and properties of TaxN thin films [J]. Microelec Engineer, 2002, 64(1-4): 289-297.

    [14] CHEN D, WU J, YANG F B, et al. Microstructure, hardness, and wear resistance of sputtering TaN coating by controlling RF input power [J]. Surface & Coatings Technol, 2016.

    [15] LEE D W, KIM Y N, CHO M Y, et al. Reliability and characteristics of magnetron sputter deposited tantalum nitride for thin film resistors [J]. Thin Solid Films, 2018, 660(8): 688-694.

    CAO Qianlong, WU Qiannan, ZHU Guangzhou, CHEN Yu, WANG Junqiang, LI Mengwei. Design of a Four Port Electronic Calibrator Based on RF MEMS Switch[J]. Microelectronics, 2022, 52(3): 437
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