• Laser & Optoelectronics Progress
  • Vol. 52, Issue 10, 103003 (2015)
Yi Cheng*, Wang Chuanxin, Xiong Jiang, Fan Yongzhi, Wang Jianhua, Ma Zhibin, Man Weidong, and Wang Shenggao
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    DOI: 10.3788/lop52.103003 Cite this Article Set citation alerts
    Yi Cheng, Wang Chuanxin, Xiong Jiang, Fan Yongzhi, Wang Jianhua, Ma Zhibin, Man Weidong, Wang Shenggao. Analysis of Optical Emission Spectroscopy in Diamond of Hot Filament Chemical Vapor Deposition[J]. Laser & Optoelectronics Progress, 2015, 52(10): 103003 Copy Citation Text show less
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    [4] Vandevelde T, Nesladek M, Quaeyhaegens C, et al.. Optical emission spectroscopy of the plasma during microwave CVD of diamond thin films nitrogen addition and relation to the thin film morphology[J]. Thin solid films, 1997, 308: 154-158.

    [5] Zhou H Y, Matanabe J, Miyake M, et al.. Optical and mass spectroscopy measurements of Ar/CH4/H2 microwave plasma for nano-crystalline diamond film deposition[J]. Diamond and Related Materials, 2007, 16(1): 675-678.

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    Yi Cheng, Wang Chuanxin, Xiong Jiang, Fan Yongzhi, Wang Jianhua, Ma Zhibin, Man Weidong, Wang Shenggao. Analysis of Optical Emission Spectroscopy in Diamond of Hot Filament Chemical Vapor Deposition[J]. Laser & Optoelectronics Progress, 2015, 52(10): 103003
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