• Laser & Optoelectronics Progress
  • Vol. 56, Issue 15, 152202 (2019)
Xueliang Kang1、*, Haibing Yao1, Qilong Liu1, Li Wang1、2, Bai Zhang1, and Ke Chen2
Author Affiliations
  • 1 School of Electrical & Information Engineering, North Minzu University, Yinchuan, Ningxia 750021, China;
  • 2 School of Mechanical Engineering, Hefei University of Technology, Hefei, Anhui 230009, China
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    DOI: 10.3788/LOP56.152202 Cite this Article Set citation alerts
    Xueliang Kang, Haibing Yao, Qilong Liu, Li Wang, Bai Zhang, Ke Chen. Secondary Optical Design for Uniform Illumination of Extended Sources Based on Refractive Index Pre-Compensation Method[J]. Laser & Optoelectronics Progress, 2019, 56(15): 152202 Copy Citation Text show less
    Diagram of light distribution principle ofsingle free-form surface lens
    Fig. 1. Diagram of light distribution principle ofsingle free-form surface lens
    Secondary optical design of point source for uniform illumination. (a) Profile of light distribution lens; (b) diagram of uniform illumination principle
    Fig. 2. Secondary optical design of point source for uniform illumination. (a) Profile of light distribution lens; (b) diagram of uniform illumination principle
    Three-dimensional solid model of light distribution lens designed for point source
    Fig. 3. Three-dimensional solid model of light distribution lens designed for point source
    Illuminance distributions of approximate point source. (a) Two-dimensional distribution; (b) one-dimensional distribution
    Fig. 4. Illuminance distributions of approximate point source. (a) Two-dimensional distribution; (b) one-dimensional distribution
    Illuminance distributions of extended source. (a) Two-dimensional distribution; (b) one-dimensional distribution
    Fig. 5. Illuminance distributions of extended source. (a) Two-dimensional distribution; (b) one-dimensional distribution
    Two-dimensional and one-dimensional illuminance distributions of approximate point source with different shifts in positive direction of y axis. (a) Shift of 1 mm; (b) shift of 2 mm; (c) shift of 3 mm
    Fig. 6. Two-dimensional and one-dimensional illuminance distributions of approximate point source with different shifts in positive direction of y axis. (a) Shift of 1 mm; (b) shift of 2 mm; (c) shift of 3 mm
    Degradation reasons of illumination effect of extended source
    Fig. 7. Degradation reasons of illumination effect of extended source
    Principle of uniform illumination of extended source in refractive index pre-compensation method
    Fig. 8. Principle of uniform illumination of extended source in refractive index pre-compensation method
    Profile of light distribution lens modified by refractive index pre-compensation method
    Fig. 9. Profile of light distribution lens modified by refractive index pre-compensation method
    Illuminances of point source after modifying by refractive index pre-compensation method. (a) Two-dimensional distribution; (b) one-dimensional distribution
    Fig. 10. Illuminances of point source after modifying by refractive index pre-compensation method. (a) Two-dimensional distribution; (b) one-dimensional distribution
    Illuminances of extended source after modifying by refractive index pre-compensation method. (a) Two-dimensional distribution; (b) one-dimensional distribution
    Fig. 11. Illuminances of extended source after modifying by refractive index pre-compensation method. (a) Two-dimensional distribution; (b) one-dimensional distribution
    Xueliang Kang, Haibing Yao, Qilong Liu, Li Wang, Bai Zhang, Ke Chen. Secondary Optical Design for Uniform Illumination of Extended Sources Based on Refractive Index Pre-Compensation Method[J]. Laser & Optoelectronics Progress, 2019, 56(15): 152202
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