[1] Steven Dzioba, R. Rousina. Dielectric thin film deposition by electron cyclotron resonance plasma chemical vapor deposition for optoelectronics. J. Vac. Sci. Technol., 1994, B12(1):433~440
[2] Y. Manabe, T. Mitsuyu. Silicon nitride thin films prepared by the electron cyclotron resonance plasma chemical vapor deposition method. J. Appl. Phys., 1989, 66(6):2475~2480
[3] Jinho Ahn., Katsumi Suzuki. Stress-controlled Silicon nitride film with high optical transmittance prepared by an ultrahigh-vacuum electron cyclotron resonance plasma chemical-vapor deposition system. Appl. Phys. Lett., 1994, 64(24):3249~3251
[4] Takashi Inukai, Ken′ichi Ono. Optical characteristics of amorphous silicon nitride thin films prepared by electron cyclotron resonance plasma chemical vapor deposition. Jpn. J. Appl. Phys., 1994, 33(5A):2593~2598
[5] A. R. Shimkunas, E. Mauger, L. P. Bourget et al.. Advanced electron cyclotron resonance chemical vapor deposition SiC coatings and X-ray mask membranes. J. Vac. Sci. Technol., 1991, B9(6):3258~3261
[6] Tan Manqing. All-dielectric optical coatings deposition by ECR plasma CVD, in Congress for GaAs and other chemical compound in 1997, Zhangjiajie: Semiconductor material committee, institute of national color metel, 1997. 310~312