• Opto-Electronic Engineering
  • Vol. 31, Issue 5, 24 (2004)
[in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese]. Study on improving diffraction efficiency of MEMS blazed gratings[J]. Opto-Electronic Engineering, 2004, 31(5): 24 Copy Citation Text show less
    References

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    [4] TSANG W T,WANG S. Preferentially etched diffraction gratings in silicon [J]. J Appl Physics,1975,46(5):2163-2166.

    [5] GRAF U U,JAFFE D T,KIM E,et al. Fabrication and evaluation of an etched infrared diffraction grating [J]. Appl. Opt. 1994,33(1):96-102.

    [6] JAFFE D T,KELLER L D,ERSHOV O A. Micromachined silicon diffraction gratings for infrared spectroscopy[J]. SPIE. 1998,3354:201-212.

    [7] KELLER L D,JAFFE D T,ERSHOV O A,et al. Fabrication and testing of chemically micromachined silicon echelle gratings [J] . Appl. Opt,2000,39(7):1094-1105.

    [8] FUJII Y,AOYAMA I,MINOWA J I. Optical demultiplexer using a silicon echelette grating[J]. IEEE J. Quantum Electron. 1980,16(2):165-169.

    [10] MADOU M,Fundamentals of microfabrication [M]. Boca Raton:CRC Press,1997.

    [12] MARXER C,GRETILLAT M A,ROOIJ N F,et al. Reflective Duplexer Bsaed on Silicon Micromechanics for Fiber-optic Communication[J]. Journal of Lightwave Technology. 1999,17(1):115-122.

    [in Chinese], [in Chinese], [in Chinese]. Study on improving diffraction efficiency of MEMS blazed gratings[J]. Opto-Electronic Engineering, 2004, 31(5): 24
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